术语和定义

 Technical terms and definitions

术语
Technical terms

代号
Code

定义
Definitions

腐蚀箔
Etched Foil

－

经过电化学腐蚀扩面，表面未经化成处理的铝箔
Foils treated by electrochemical etching process before forming process.

化成箔
Formed Foil

－

经电化学阳极氧化处理表面形成致密介质氧化膜的铝箔
Foils treated by electrochemical anodic oxidation  treatment forming dense medium oxide film on suface.

阳极箔
Anode Foil

铝电解电容器阳极用的铝箔
Foils used as an anode of a capacitor.

化成处理
Formation

－

以电化学阳极氧化处理使箔表面产生具有半导电体特性的铝氧化膜（Al2O3）的过程
The process of electrochemical anode treatment to make the etched foil have semiconductor property aluminium oxide film( Al2O3).

工作电压
Working voltage

WV

铝电解电容器额定工作电压
The rated working voltage for aluminium capacitor.

化成电压
Formation voltage

Vfe

对腐蚀箔氧化处理过程中施加最后电压值
Final voltage value applied to etched foil durng forming process.

氧化膜耐电压
Dielectric withstanding Voltage

Vt

化成箔在达到升压时间之后3min时的电压值
Voltage value of formed foil after reaching rise time  3 minutes.

 额定氧化膜耐电压
Nominal Formation Voltage

Vf

化成箔的氧化膜耐电压的额定值。
Nominal value of dielectric withstanding voltage.

升压时间
Rising time

Tr

将额定电流导入化成箔上开始计时，直到电压达到额定的氧化膜耐电压值的90%时所需的时间。
Time at which the applied voltage reaches 90% of nominal formation voltage with a specified elctronic current applied to formed foil.

水和处理
Hydration Process

－

将化成箔置于高温纯水中进行煮沸的处理过程
The process of immersion of foil in deionized water at high temperature.

耐水和性
Hydration  Resistance

Tr60

经水和处理后所得的化成箔的升压时间
The rising time of formed foil after hydration treatment.

纯水
Deionized water

－

经离子交换树脂处理过在25℃时的电阻率大于1.0MΩ•cm的去离子水
The deinized water when resistivity more than 1.0MΩ•cm treated by ion exchange at 25℃.

 低压化成箔
Low voltage formed foil

－

电解电容器工作电压小于等于120WV所用的化成铝箔
Formed foil for elctrolytic capacitors with the working voltage lower than 120WV.

 中高压化成箔
Medium and high voltage foil

－

电解电容器工作电压大于等于170WV所用的化成铝箔
Formed foil for elctrolytic capacitors with the working voltage higer than 170WV.

比容
Capacitance

－

单位面积铝箔的静电容量
Capacitance in unit area of alumium foil.